化学蒸汽沉积
Vapour epitaxial grown single-crystal diamond film on diamond surface was obtained by microwave reinforced chemical vapour deposition method, using hydrogen, aceton vapour as source of gas.
用氢气、丙酮蒸汽为源气体，通过微波增强的化学气相沉积方法，实现了在金刚石表面气相外延生长单晶金刚石薄膜。
Coating by physical vapour deposition (PVD), coating by chemical vapour deposition (CVD) and surface layer modification by ion implantation, all three are being tested and are partly in use.
涂层的化学气相沉积（CVD）和表面层改性的物理气相沉积（PVD）涂层的离子注入，所有三个正在受到考验，并部分使用。
The present article introduces a new technique of chemical vapour deposition titanium Carbide.
本文介绍了一种新的化学气相沉积碳化钛方法。
A description is given of the effect of high temperature treatment on tribological properties of carbon/carbon (C/C) composites prepared by chemical vapour deposition.
研究了高温处理对化学气相沉积碳／碳（简称C／C）复合材料摩擦磨损性能的影响，分析了经过不同温度处理的试样的刹车力矩-刹车时间曲线。
In this paper, the hot-filament chemical vapour deposition (HF-CVD) method to form CNT-tip is introduced. The design of the HF-CV…
文中提出了一套制备碳纳米管探针的热丝化学气相沉积（HF-CVD）装置，叙述了HF-CVD的原理、装置以及在纳米加工上的应用。
In contrast, modern lab created diamonds are made in a laboratory by one of two methods either by HPHT (High Pressure High Temperature) or CVD (Chemical Vapour Deposition).
相比之下，现代的实验室创建的钻石是在实验室中通过高温高压（高温高压）或CVD（化学气相沉积）两种方法之一。
This course introduces the basic theory and applied technology on the diamond film and related materials. It includes:(1) Chemical vapour deposition (CVD) diamond films;
本课程介绍了金刚石薄膜及其相关材料的基础理论和应用技术，主要包括（1）金刚石薄膜制备；
In the present paper, the relation between diamond nucleation density and synthesis conditions is stu***d for the diamond thin film synthesized by hot filament chemical vapour deposition method.
本文研究了用热灯丝化学气相沉积方法在单晶硅衬底上制备金刚石薄膜时其成核密度与制备条件的关系。
This paper reviews comprehensively the recent development of amorphous silicon films fabricated by light induced chemical vapour deposition(LCVD).
本文较系统地评述了光诱导化学汽相淀积（LCVD）技术淀积非晶硅薄膜的开发现；
A review is presented on the synthesis of non-cabonic nanotubes such as chemical-vapour deposition, laser ablation, hydrothermal, template method and self-assembling method.
介绍非碳类纳米管的合成方法，包括化学气相沉积法、激光烧蚀法、水热法、模板法和自组装法等。
The results show that the vapour pressure and the mass loss rate of tantalum propoxide, tantalum butoxide and niobium ethoxide are suited for chemical vapor deposition.
结果表明，丙醇钽、丁醇钽和乙醇铌的蒸汽压大小能够满足化学气相沉积的要求，有足够的挥发速率。
In general, the carbide coating of chemical vapour deposition resists wear. But these surface coatings have a high roughness, which causes violent wear in the matched test pieces.
化学气相沉积的碳化物镀层一般很耐磨，但这些表面层镀后的粗糙度较高，会使与之相配的试件受到剧烈磨损。
This paper mainly introduces application of chemical vapour deposition (CVD) technology to the cold-drawn ***s and relevant methods to make ***s by using this technology.
本文主要介绍化学气相沉积（CVD）技术应用于冷拔模具以及采用该技术的模具在制作过程中的几个问题。
This paper has discussed preparing Diamond-like Carbon films by means of micro-wave ECR plasma source ion implantation and plasma enhanced chemical vapour deposition .
本文探讨了利用微波ECR全方位离子注入技术和等离子增强化学气相沉积技术来制备类金刚石膜。
Helical carbon nanotubes were synthesized by a chemical vapour deposition method from both silica aerogels and silica xerogels containing catalysts.
采用气凝胶与干凝胶两种催化剂载体通过化学气相淀积方法制备出螺旋状的碳纳米管。
Update the processing methods to make SOFC from solid electrolytical film are by chemical vapour deposition, electrophoretic deposition, flow stretching, sputtering, plasma sputter coating, etc.
目前，SOFC用固体电解质薄膜制备方法有电化学气相沉积法、化学气相沉积法、电泳沉积法、溅射法、等离子喷涂法等。
Several methods are used in preparation of FTO, which include chemical vapour deposition (CVD), sputtering, thermal evaporation and sol-gel technique.
已经有几种方法用于制备FTO薄膜，包括气相沉积法（CVD）、溅射、热蒸发法、溶胶凝胶法。
Developments of diamond films by plasma chemical vapour deposition are reviewed in the paper.
本文介绍和评述了化学气相沉积法制备人造金刚石薄膜及其进展。
Diamond thin films were deposited on molybdenum substrate by Hot Filament Assisted Chemical Vapour Deposition(HFACVD) method in H2 plus CH4 mixture precursor.
用热灯丝铺助化学汽相沉积（HFACVD）法，以H_2十CH_4为原料在钼基板上沉积出了金刚石膜。
In this paper, we review emphasizedly several chemical vapour deposition methods and some properties of silicon nitride thin film.
本文着重评述了制备氮化硅薄膜的几种化学气相沉积方法和一些性能。
Chemical vapour deposition is a preferable method.
化学气相沉积法是最可行的方法。
化学气相沉积（Chemical Vapour Deposition，简称CVD）是一种在高温或等离子体等能量激活条件下，利用气态前驱体在基底表面发生化学反应，生成固态薄膜材料的关键工艺技术。其核心原理是通过精确控制气相化学反应，使反应产物以原子或分子形式沉积在基材上，形成高纯度、高致密性且具有特定功能的薄膜。
工艺原理与步骤：
$$ce{SiH4(g) ->[Delta] Si(s) + 2H2(g)}$$
或化学置换反应（例如：
$$ce{WF6(g) + 3H2(g) -> W(s) + 6HF(g)}$$。
核心应用领域：
技术优势与挑战：
权威文献来源建议：
- 《薄膜沉积原理》（Principles of Chemical Vapor Deposition）by D. M. Dobkin
- 美国材料试验协会标准 ASTM F76 - CVD硅膜测试规范
- 真空科学与技术A辑（Journal of Vacuum Science & Technology A）CVD专题论文集
Chemical Vapour Deposition (CVD) 是一种通过气态前驱体在基材表面发生化学反应，生成固态薄膜或涂层的技术。以下是详细解释：
如需更完整的技术分类或案例，可参考来源网页。
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