chemical vapour deposition是什麼意思，chemical vapour deposition的意思翻譯、用法、同義詞、例句

化學蒸汽沉積

Vapour epitaxial grown single-crystal diamond film on diamond surface was obtained by microwave reinforced chemical vapour deposition method, using hydrogen, aceton vapour as source of gas.

用氫氣、丙酮蒸汽為源氣體，通過微波增強的化學氣相沉積方法，實現了在金剛石表面氣相外延生長單晶金剛石薄膜。

Coating by physical vapour deposition (PVD), coating by chemical vapour deposition (CVD) and surface layer modification by ion implantation, all three are being tested and are partly in use.

塗層的化學氣相沉積（CVD）和表面層改性的物理氣相沉積（PVD）塗層的離子注入，所有三個正在受到考驗，并部分使用。

The present article introduces a new technique of chemical vapour deposition titanium Carbide.

本文介紹了一種新的化學氣相沉積碳化钛方法。

A description is given of the effect of high temperature treatment on tribological properties of carbon/carbon (C/C) composites prepared by chemical vapour deposition.

研究了高溫處理對化學氣相沉積碳／碳（簡稱C／C）複合材料摩擦磨損性能的影響，分析了經過不同溫度處理的試樣的刹車力矩-刹車時間曲線。

In this paper, the hot-filament chemical vapour deposition (HF-CVD) method to form CNT-tip is introduced. The design of the HF-CV…

文中提出了一套制備碳納米管探針的熱絲化學氣相沉積（HF-CVD）裝置，叙述了HF-CVD的原理、裝置以及在納米加工上的應用。

In contrast, modern lab created diamonds are made in a laboratory by one of two methods either by HPHT (High Pressure High Temperature) or CVD (Chemical Vapour Deposition).

相比之下，現代的實驗室創建的鑽石是在實驗室中通過高溫高壓（高溫高壓）或CVD（化學氣相沉積）兩種方法之一。

This course introduces the basic theory and applied technology on the diamond film and related materials. It includes:(1) Chemical vapour deposition (CVD) diamond films;

本課程介紹了金剛石薄膜及其相關材料的基礎理論和應用技術，主要包括（1）金剛石薄膜制備；

In the present paper, the relation between diamond nucleation density and synthesis conditions is stu***d for the diamond thin film synthesized by hot filament chemical vapour deposition method.

本文研究了用熱燈絲化學氣相沉積方法在單晶矽襯底上制備金剛石薄膜時其成核密度與制備條件的關系。

This paper reviews comprehensively the recent development of amorphous silicon films fabricated by light induced chemical vapour deposition(LCVD).

本文較系統地評述了光誘導化學汽相澱積（LCVD）技術澱積非晶矽薄膜的開發現；

A review is presented on the synthesis of non-cabonic nanotubes such as chemical-vapour deposition, laser ablation, hydrothermal, template method and self-assembling method.

介紹非碳類納米管的合成方法，包括化學氣相沉積法、激光燒蝕法、水熱法、模闆法和自組裝法等。

The results show that the vapour pressure and the mass loss rate of tantalum propoxide, tantalum butoxide and niobium ethoxide are suited for chemical vapor deposition.

結果表明，丙醇钽、丁醇钽和乙醇铌的蒸汽壓大小能夠滿足化學氣相沉積的要求，有足夠的揮發速率。

In general, the carbide coating of chemical vapour deposition resists wear. But these surface coatings have a high roughness, which causes violent wear in the matched test pieces.

化學氣相沉積的碳化物鍍層一般很耐磨，但這些表面層鍍後的粗糙度較高，會使與之相配的試件受到劇烈磨損。

This paper mainly introduces application of chemical vapour deposition (CVD) technology to the cold-drawn ***s and relevant methods to make ***s by using this technology.

本文主要介紹化學氣相沉積（CVD）技術應用于冷拔模具以及采用該技術的模具在制作過程中的幾個問題。

This paper has discussed preparing Diamond-like Carbon films by means of micro-wave ECR plasma source ion implantation and plasma enhanced chemical vapour deposition .

本文探讨了利用微波ECR全方位離子注入技術和等離子增強化學氣相沉積技術來制備類金剛石膜。

Helical carbon nanotubes were synthesized by a chemical vapour deposition method from both silica aerogels and silica xerogels containing catalysts.

采用氣凝膠與幹凝膠兩種催化劑載體通過化學氣相澱積方法制備出螺旋狀的碳納米管。

Update the processing methods to make SOFC from solid electrolytical film are by chemical vapour deposition, electrophoretic deposition, flow stretching, sputtering, plasma sputter coating, etc.

目前，SOFC用固體電解質薄膜制備方法有電化學氣相沉積法、化學氣相沉積法、電泳沉積法、濺射法、等離子噴塗法等。

Several methods are used in preparation of FTO, which include chemical vapour deposition (CVD), sputtering, thermal evaporation and sol-gel technique.

已經有幾種方法用于制備FTO薄膜，包括氣相沉積法（CVD）、濺射、熱蒸發法、溶膠凝膠法。

Developments of diamond films by plasma chemical vapour deposition are reviewed in the paper.

本文介紹和評述了化學氣相沉積法制備人造金剛石薄膜及其進展。

Diamond thin films were deposited on molybdenum substrate by Hot Filament Assisted Chemical Vapour Deposition(HFACVD) method in H2 plus CH4 mixture precursor.

用熱燈絲鋪助化學汽相沉積（HFACVD）法，以H_2十CH_4為原料在钼基闆上沉積出了金剛石膜。

In this paper, we review emphasizedly several chemical vapour deposition methods and some properties of silicon nitride thin film.

本文着重評述了制備氮化矽薄膜的幾種化學氣相沉積方法和一些性能。

Chemical vapour deposition is a preferable method.

化學氣相沉積法是最可行的方法。